Nikon ECLIPSE LV150NA and LV150N
These microscopes with episcopic illumination are for inspection of semiconductors, industrial materials and components. They are also suited to research and development applications.
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Products Infomation
A series of flexible, modular, upright microscopes for various episcopic optical contrast techniques (BF-DF-DIC-POL-Fluorescence-Interferometry). Together with digital imaging accessories and large stage X-Y travels, the instruments are ideal for semiconductor and material inspection activities.
INDUSTRIAL ECLIPSE
Model:
LV150NA and LV150N
Maker:
Nikon Metrology NV
These microscopes with episcopic illumination are for inspection of semiconductors, industrial materials and components. They are also suited to research and development applications.
Nikon’s innovative design enables clear imaging techniques, including high-contrast, brightfield, darkfield, polarisation (POL), interference contrast (DIC) and double beam interferometry optical contrast.
The full range of Nikon’s Digital Sight cameras can capture images of a sample and deliver them to the image processing software of the NIS-Elements suite, together with microscope data on the objective lens, magnification setting and light intensity when using the LV-ECON E controller.
Nikon’s wafer loaders are well accepted and trusted across the semiconductor industry and many installations are in use today.
Reflected light: brightfield, darkfield, polarising (POL), differential interference contrast (DIC), epi-fluorescence and two-beam interferometry.
From lamphouse to eyepiece, components are selected to match a user’s application. They include stands, stages, objectives, nosepieces, optical heads, eyepieces, digital cameras, filters and contrast technique accessories.
By means of an LV-ECON E controller, LV150NA and LV150N microscopes can detect and control the objective lens, light intensity, aperture and epi-contrast via Nikon’s NIS-Elements software. The LV150N detects and reports on the objective lens using the LV-NU5I and LV-INAD.
Optimal positioning of operator controls and a variable angle eye-tube allow fatigue-free work. The right-way-up, right-way-around image enables raw materials, semiconductors and industrial components to be correctly observed.